| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method which improves productivity and reduces a cost by curtailing a manufacturing process of indium oxide-zinc oxide from powder starting materials without essentially impairing the characteristics as an IZO sputtering target. SOLUTION: In the manufacturing method for the IZO sputtering target, the powder starting material of indium oxide having a specific surface of 8-10 m<2> /g and zinc oxide having a specific surface of 2-4 m<2> /g, or a starting material essentially consisting of these are mixingly pulverized using a wet medium stirring mill and, after a post-pulverized specific surface is increased by 1.5-2.5 m<2> /g from the specific surface of the mixed powder starting materials, it is molded and sintered at 1,300-1,500 deg.C in an oxygen atmosphere. |
