| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist removing solution which excellently prevents corrosion of metal wiring of both Al and Cu and which has excellent power to remove a photoresist film and residue after ashing. SOLUTION: The photoresist removing solution contains (a) N,N- diethylhydroxylamine, (b) a quaternary ammonium hydroxide of formula (I) [where R1 to R4 are each alkyl (but may have N in its structure) and the total number of C atoms in R1 -R4 is >=10], (c) a water-soluble organic solvent other than N,N-diethylhydroxylamine, (d) an anticorrosive and (e) water.
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