发明名称 |
TREATMENT METHOD AND DEVICE USING XY STAGE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a treatment method using XY stage capable of suppressing the deterioration of arrangement accuracy of an XY stage even when the regularity of movement of the stage is broken. SOLUTION: An object to be treated is held on the XY stage capable of translating in mutually orthogonal X- and Y-axial directions. The XY stage is moved to a first position. The XY stage is run up in the X- and Y-axial negative directions and stopped in a second position. While the XY stage is stopped in the second stage, a treatment is performed to the object. The XY stage is moved in the Y-axial negative direction by a certain distance, and the treatment to the object is performed while the XY stage is stopped. This procedure is repeatedly executed.</p> |
申请公布号 |
JP2002357685(A) |
申请公布日期 |
2002.12.13 |
申请号 |
JP20010167209 |
申请日期 |
2001.06.01 |
申请人 |
FUJITSU LTD;FUJITSU VLSI LTD |
发明人 |
OSHIMA TORU |
分类号 |
G01B11/00;B23Q1/48;B23Q1/62;B23Q17/24;G03F1/76;G03F1/78;G03F7/20;G05D3/00;G12B5/00;H01L21/027;H01L21/68;(IPC1-7):G12B5/00;G03F1/08 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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