发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To realize a semiconductor device which avoids a fatigue breakdown by relaxing a thermal stress and to provide a method for manufacturing the same. SOLUTION: The method for manufacturing the semiconductor device comprises the steps of standing a wire bump 5 on a wiring pattern layer 2 via a contact hole CH perforated at an insulating film layer 3 of an interposer substrate 1, filling an elastic resin 11 in the hole CH, and forming a bump electrode in which a root part of the wire bump 5 is resin-fixed. Thus, as a result that the root of the bump 5 is embedded in the resin 11, the thermal stress can be relaxed while holding a sufficient strength.</p>
申请公布号 JP2002359322(A) 申请公布日期 2002.12.13
申请号 JP20010166150 申请日期 2001.06.01
申请人 IEP TECHNOLOGIES:KK 发明人 SADABETTO HIROYASU
分类号 H01L23/12;(IPC1-7):H01L23/12 主分类号 H01L23/12
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