| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a new UV absorbent that has a maximum absorption in a shortwave range, has a heat-removable protection group and has a low crystallinity, to provide a manufacturing method therefor, a UV absorbent- containing composition that does not cause image defects and has excellent storing stability, and a method for forming images using the composition. SOLUTION: This UV absorbent is represented by the general formula (1) (wherein R<1> is an alkenyl group where all the R<1> 's are the same; and R<2> -R<4> are each a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom). The UV absorbent is manufactured by reacting, in the presence of a base, a compound represented by the general formula (2) and an alkenylation agent represented by the general formula (3) (wherein R<2> -R<4> are each a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom; X is a halogen atom, -OSO2 R<5> , or -OSO2 OR<1> ; and R<9> is an alkyl group or an aryl group). A composition containing the UV absorbent is used for forming images.</p> |
