| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern inspecting apparatus and a method for dissolving gain unevenness due to the local gain deterioration of a detector. SOLUTION: The pattern inspection device 20 is provided with a primary optical system 1 for irradiating a substrate 42, where a pattern being the object of inspection is formed with primary electron beams 5, an electron detection part 3 for detecting secondary electrons/reflected electrons radiated from the substrate 42 by the irradiation of the primary electron beams 5 as secondary electron beams 6 and outputting an image signal, forming a two-dimensional image or one-dimensional image showing the state of the pattern and a secondary optical system 2 which magnifies and projects the secondary electron beams 6 and forms the image is used. The secondary electron beams, which are uniform two-dimensionally, are made incident on the electron detection part 3 prior to the inspection of the pattern, and a reference image showing the gain distribution of the electron detection part 3 has been previously obtained. Gain uneveness caused by the gain uneveness of the electron detection part 3 is corrected based on the reference picture in the two-dimensional image or the one-dimensional image obtained by the inspection of the pattern.
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