PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND SUBSTRATE HAVING THE RESIST PATTERN LAMINATED THEREON,申请号KR1020027005163-传众专利搜索

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发明名称	PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND SUBSTRATE HAVING THE RESIST PATTERN LAMINATED THEREON
摘要
申请公布号	KR20020092920(A)	申请公布日期	2002.12.12
申请号	KR1020027005163	申请日期	2002.04.22
申请人		发明人
分类号	G03F7/004	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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