发明名称 |
GRADED COMPOSITE LAYER AND METHOD FOR FABRICATION THEREOF |
摘要 |
Within both a fabrication and a method for fabricating the fabrication there is provided a second layer of a second material separated on one of its sides from a first layer of a first material by a first transition layer of a transition material. The second layer of the second material is also separated on the other of its sides from a third layer of the first material by a second transition layer of the transition material. Within both the fabrication and the method for fabricating the fabrication, the transition material provides a continuous transition between the first material and the second material.
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申请公布号 |
US2002185711(A1) |
申请公布日期 |
2002.12.12 |
申请号 |
US20010876446 |
申请日期 |
2001.06.07 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN SHIH-CHI |
分类号 |
C23C16/02;C23C16/30;H01L21/314;(IPC1-7):H01L23/58;H01L21/31;H01L21/469 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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