发明名称 |
Semiconductor element used as a hetero-structure bipolar or field effect transistor has semiconductor layer system formed on a substrate. |
摘要 |
Semiconductor element comprises a substrate; a first semiconductor layer system grown on the substrate and having a first semiconductor layer made from a first semiconductor material with a first band gap; a second semiconductor layer system grown on the first semiconductor layer and having a second semiconductor layer made from a second semiconductor material with a second band gap; and a third semiconductor system grown on the second semiconductor layer system having a third semiconductor layer made from a third semiconductor material with a third band gap. An Independent claim is also included for a process for the production of the semiconductor element. Preferred Features: The first and third semiconductors layers are structured in such a way that one forms the collector and the other the emitter of the transistor. The second semiconductor layer is a spacer layer grown on the base of the transistor.
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申请公布号 |
DE10125711(A1) |
申请公布日期 |
2002.12.12 |
申请号 |
DE20011025711 |
申请日期 |
2001.05.28 |
申请人 |
IPAG - INNOVATIVE PROCESSING AG |
发明人 |
VELLING, PETER |
分类号 |
H01L29/15;H01L29/737;H01L29/778;H01L29/88;(IPC1-7):H01L29/15;H01L21/328;H01L29/80 |
主分类号 |
H01L29/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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