发明名称 Semiconductor element used as a hetero-structure bipolar or field effect transistor has semiconductor layer system formed on a substrate.
摘要 Semiconductor element comprises a substrate; a first semiconductor layer system grown on the substrate and having a first semiconductor layer made from a first semiconductor material with a first band gap; a second semiconductor layer system grown on the first semiconductor layer and having a second semiconductor layer made from a second semiconductor material with a second band gap; and a third semiconductor system grown on the second semiconductor layer system having a third semiconductor layer made from a third semiconductor material with a third band gap. An Independent claim is also included for a process for the production of the semiconductor element. Preferred Features: The first and third semiconductors layers are structured in such a way that one forms the collector and the other the emitter of the transistor. The second semiconductor layer is a spacer layer grown on the base of the transistor.
申请公布号 DE10125711(A1) 申请公布日期 2002.12.12
申请号 DE20011025711 申请日期 2001.05.28
申请人 IPAG - INNOVATIVE PROCESSING AG 发明人 VELLING, PETER
分类号 H01L29/15;H01L29/737;H01L29/778;H01L29/88;(IPC1-7):H01L29/15;H01L21/328;H01L29/80 主分类号 H01L29/15
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