| 发明名称 |
Method for calibrating nanotopographic measuring equipment |
| 摘要 |
The present invention is directed to a method of calibrating a laser scanning nanotopography measuring device with a metrology standard having grown-in nanotopographic artifacts on the surface of an epitaxial layer on a silicon wafer substrate.
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| 申请公布号 |
US2002185053(A1) |
申请公布日期 |
2002.12.12 |
| 申请号 |
US20010865083 |
申请日期 |
2001.05.24 |
| 申请人 |
FEI LU;YANG CHARLES CHUIN-CHIEH |
发明人 |
FEI LU;YANG CHARLES CHUIN-CHIEH |
| 分类号 |
G01B11/00;G01N21/95;(IPC1-7):C30B1/00 |
主分类号 |
G01B11/00 |
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