| 摘要 |
The present invention provides a focused ion beam device that can automatically carry out pattern matching and shape measurement by adjusting brightness levels of microscope images on a display so that an observation region, becomes an appropriate brightness without being affected by brightness of peripheral images within the field of view, so as to be able to effectively carry out feature extraction of a noted pattern. Also, a system for supporting operations is constructed that does not require a series of operations to be executed in the presence of an operator each time in the event that fixed shape measurement is carried out. Brightness control for a scanning electron microscope of the present invention is provided with means for designating a desired region of a microscope image, means for designating an average brightness of an image within the specified region, and means for controlling overall brightness of the microscope image based on the specified amount of brightness control, thus making it possible to display an image within a designated region at an appropriate brightness without being affected by a peripheral image within the field of view. Also, by providing a sample stage drive mechanism capable of movement in at least two dimensions and changing inclination, means for executing a series of slicing operations and noted pattern access programs from slicing machining to tilting of the sample stage and acquisition of a microscope mage of the sliced section, and means for executing noted pattern shape measurement in accordance with the programs, it is possible to automatically measure shape of a pattern formed in the sliced section of the sample.
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