发明名称 |
Position detection method and apparatus |
摘要 |
<p>A reticle stage reference mark 3 of material having high reflectivity to alignment illumination light is provided on a reticle 5, and a chuck mark 8 of material having high reflectivity to the alignment illumination light is provided on a wafer chuck 11. A relative position of the reticle stage reference mark 3 to the chuck mark 8 is detected by using a first position detection optical system 1 and a first illumination optical system 2, and relative alignment is performed between the reticle 5 and a wafer 10.</p> |
申请公布号 |
EP1265107(A2) |
申请公布日期 |
2002.12.11 |
申请号 |
EP20020253614 |
申请日期 |
2002.05.22 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUZUKI, TAKEHIKO;INA, HIDEKI;SENTOKU, KOICHI;OISHI, SATORU |
分类号 |
G01B11/00;G03F9/00;G03F7/20;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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