发明名称 Improved sample inspection system
摘要 <p>A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles. &lt;IMAGE&gt;</p>
申请公布号 EP1265063(A1) 申请公布日期 2002.12.11
申请号 EP20020012062 申请日期 1998.09.18
申请人 KLA-TENCOR CORPORATION 发明人 VAEZ-IRAVANI, MEHDI;STOKOWSKI, STANLEY;ZHAO, GUOHENG
分类号 G01N21/956;G01J3/44;G01N21/00;G01N21/21;G01N21/47;G01N21/88;G01N21/94;G01N21/95;H01L21/66;(IPC1-7):G01N21/00;G01B11/24;G01B7/34;G01N21/86 主分类号 G01N21/956
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