发明名称 METHOD FOR MANUFACTURING STRUCTURE OF MEMS FOR PREVENTING STICTION
摘要 PURPOSE: A method for manufacturing a structure of MEMS(Micro Electro Mechanical System) for preventing stiction is provided to prevent micro-structures from being sticked to a substrate. CONSTITUTION: A substrate(100) is prepared. A removable stiction preventing layer(101) used in a dry-etching is formed on the substrate(100). A removable sacrificial layer(103) used in a wet-etching is then formed on the stiction preventing layer(101). A post hole is formed to expose the surface of the substrate(100) by selectively etching the stiction preventing layer(101) and the sacrificial layer(103). A structure layer(109) is formed on the resultant structure including the post hole. An SOG(Silicon On Glass), polysilicon, or photoresist is used as the stiction preventing layer(101). Also, the sacrificial layer(103) is one selected from group consisting of PSG(Phosphosilicaglass), SiO2, Cu, Fe, Mo, Ni, Cr, and TEOS(Tetra Ethyl Ortho Silicate) glass.
申请公布号 KR20020091856(A) 申请公布日期 2002.12.11
申请号 KR20010030085 申请日期 2001.05.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, GI DEOK;YOON, YONG SEOP
分类号 G03F7/004;B81B3/00;B81C1/00;H01L21/00;(IPC1-7):H01L21/00 主分类号 G03F7/004
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