发明名称 |
Hydroxy-epoxide thermally cured undercoat for 193 NM lithography |
摘要 |
The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.
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申请公布号 |
US6492092(B1) |
申请公布日期 |
2002.12.10 |
申请号 |
US19990268429 |
申请日期 |
1999.03.12 |
申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
FOSTER PATRICK;SLATER SYDNEY GEORGE;STEINHAEUSLER THOMAS;BLAKENEY ANDREW J.;BIAFORE JOHN JOSEPH |
分类号 |
G03F7/039;C08F8/00;C08G59/62;C08G59/68;C08L63/00;C09D133/06;C09D163/00;G03F7/004;G03F7/075;G03F7/09;G03F7/11;G03F7/40;H01L21/027;(IPC1-7):G03F7/11;G03F7/26 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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