发明名称 Hydroxy-epoxide thermally cured undercoat for 193 NM lithography
摘要 The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.
申请公布号 US6492092(B1) 申请公布日期 2002.12.10
申请号 US19990268429 申请日期 1999.03.12
申请人 ARCH SPECIALTY CHEMICALS, INC. 发明人 FOSTER PATRICK;SLATER SYDNEY GEORGE;STEINHAEUSLER THOMAS;BLAKENEY ANDREW J.;BIAFORE JOHN JOSEPH
分类号 G03F7/039;C08F8/00;C08G59/62;C08G59/68;C08L63/00;C09D133/06;C09D163/00;G03F7/004;G03F7/075;G03F7/09;G03F7/11;G03F7/40;H01L21/027;(IPC1-7):G03F7/11;G03F7/26 主分类号 G03F7/039
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