| 摘要 |
In order to perform integrated exposure control with high precision even if the wavelength of a light source is changed, an exposure apparatus includes an exposure optical system, an exposure amount control unit, a wavelength changing unit, and a correction unit. The exposure optical system has a laser as a light source to irradiate a photosensitive substrate with light from the light source. The exposure amount control unit controls an exposure amount for the photosensitive substrate. The wavelength changing unit changes an oscillation wavelength of the laser to a predetermined wavelength. The correction unit corrects a target exposure amount to irradiate the photosensitive substrate in accordance with the oscillation wavelength of the laser.
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