发明名称 ARC DISCHARGE TYPE REACTION FACILITY
摘要 PROBLEM TO BE SOLVED: To simplify the piping structure when a decomposition reaction, etc., are surely effected by generating an arc discharge approximately over the entire part of both discharge surfaces facing each other of the discharge reactors and a plurality of discharge reactors are connected. SOLUTION: The discharge type reaction facility has the discharge reactor 2 which has a cylindrical outer electrode 54 with the inner peripheral surface formed as the discharge surface 57 and a cylindrical inner electrode 64 with the outer peripheral surface formed as the discharge surface 65, a gas flow device which causes the gas to be reacted to pass a cylindrical spacing d between both the discharge surfaces 57 and 65 and a power source device which impresses a discharge voltage between the cylindrical inner and outer electrodes 54 and 64 in the state that the gas to be reacted is made to pass through the cylindrical spacing d. The discharge reactor 2 has a gas inlet 4 and gas outlet 5 which exist on both end sides in the axial direction of the cylindrical inner electrode 64 and are arranged to put the cylindrical inner electrode 64 in-between and a stagnation chamber 78 which exists between the gas inlet 4 and the cylindrical inner electrode 64 and stagnates the gas to be reacted. The gas inlet 4 is communicated with the gas flow device 3.
申请公布号 JP2002355548(A) 申请公布日期 2002.12.10
申请号 JP20010166217 申请日期 2001.06.01
申请人 FAAREKKUSU:KK 发明人 TAMARU SHIGERU
分类号 B01J19/08;(IPC1-7):B01J19/08 主分类号 B01J19/08
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