| 摘要 |
PURPOSE: To obtain a developing method by which a protective layer can be removed without physically removing the protective layer before developing a resist layer and the development of the resist layer is easily controlled, by exposing the resist layer for a pattern, dissolving the protective layer with a neutral or acid water-base medium, and developing the resist layer to form the resist pattern. CONSTITUTION: A liquid photosetting resist is applied to form resist layers 3 on a printed circuit board base body 1 both surface of which are coated with copper 2. Then a material which can be dissolved in a neutral or acid water-base medium, for example, a polyvinylalcohol-vinyl acetate mixture is applied to form protective layers 4. The whole layers are heated to remove the solvent in the resist layers 3 and the protective layers 4, then dried and exposed to light for a desired pattern by using a mask or irradiating with controlled laser light. The printed circuit board base body 1 is disposed on a conveyer and cleaned with water in a removing process of the protective layers to dissolve the protective layers 4, and then the printed circuit board base body 1 is continuously subjected to a developing process of the resist layers to develop the resist layers 3 with a developer. |
