CHEMICAL SUPPLY APPARATUS OF SEMICONDUCTOR FABRICATION PROCESS EQUIPMENT

摘要

PURPOSE: A chemical supply apparatus of semiconductor fabrication process equipment is provided to minimize a hunting phenomenon and a processing error by supplying correctly the amount of chemicals in chemical vapor deposition equipment. CONSTITUTION: A chemical storage portion(10) is used for storing chemicals. The first line(12) is used for connecting the chemical storage portion(10) with a process chamber(26). An LFC(Liquid Flow Controller)(16) is installed on the first line(12) in order to control flux of the chemicals. The second line(14) is branched from the first line(12). The first valve(18) is used for controlling the chemicals. A pump(22) is connected with the second line(14) in order to pump the chemicals to the second line(14). The second valve(20) is installed on the second line(14) of a front end part of the pump(22). The second valve(20) includes an air valve.