发明名称 CLOSE ELECTRON BEAM PROJECTION ALIGNER, AND METHODS FOR MEASURING AND CALIBRATING INCLINATION OF ELECTRON BEAM IN THE CLOSE ELECTRON BEAM PROJECTION ALIGNER
摘要 PROBLEM TO BE SOLVED: To accurately measure the inclination of an electron beam. SOLUTION: A mask 32 for calibration, where a plurality of marks 32A are formed in advance is loaded, and deflection control is made by a deflector, so that an electron beam 15 enters the mark 32A of the mask 32 for calibration. The electron beam that passes through the mark 32A enters Faraday cups 70 and 72 having marks 70A and 72A, respectively, and detects the position coordinates of an XY stage 60, when the amount of electricity detected by the Faraday cups 70 and 72 becomes maximum. The position coordinates of the XY stage 60 are detected for each of the marks 32A of the mask 32 for calibration. The inclination of the electron beam 15 at a position, inputted to each mark 32A of the mask 32 for calibration is calculated, based on the position coordinates of the XY stage 60 being detected in this manner, and on the difference in the height between the marks 70A and 72A.
申请公布号 JP2002353112(A) 申请公布日期 2002.12.06
申请号 JP20010157606 申请日期 2001.05.25
申请人 RIIPURU:KK 发明人 HIGUCHI AKIRA
分类号 G03F7/20;H01J37/04;H01J37/153;H01J37/304;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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