| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a charged particle beam exposure system and an exposing method which can suppress productivity drop and rise in cost, when a foreign matters are sticking to a reticle. SOLUTION: In the charged particle beam exposure system comprising a charged particle beam source, an illumination optical system for irradiating a reticle with a charged particle beam from the charged particle beam source and a projection optical system for projecting a focused image of pattern formed to the reticle on a sensitive substrate, and a reticle-cleaning mechanism is further included for cleaning the reticle.</p> |
