| 摘要 |
PROBLEM TO BE SOLVED: To enable accurate alignment of reticle and wafer, without having to use expensive components. SOLUTION: A method for detecting a position comprises steps of disposing a reticle stage reference mark 3 constituted of a substrate having high reflectivity for an alignment light on the reticle 5 and a chuck mark 8, constituted of a substrate having high reflectivity for the alignment light on a wafer chuck 11, detecting the relative position of the mark 3 and the mark 8 by using an alignment detecting optical system 1 and an illumination optical system 2 and the like, and positioning the relative position between the reticle 5 and the wafer 10.
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