| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing semiconductor device for manufacturing a fine pattern having higher size accuracy, using a stencil mask. SOLUTION: An input layout data is sorted to rectangular shapes of different pattern widths, a boundary for dividing peripheral part or internal part is generated for each sorted figure, an input pattern is formed into a fine pattern at the boundary and a complementary mask, shared to form fine patterns in both sides of the boundary is used as different layers, in order to form a pattern.</p> |
