| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that the detected waveform for alignment to a metal plug of a photomask can easily reach the same level as the grain boundary detection waveform of aluminum causing the noise of the detection waveform, when the metal plug is buried in a via hole in an interlayer insulating film for forming aluminum wiring on it, the position accuracy in the aluminum wiring to the metal plug is deteriorated when the noise is detected, and the contact area between the aluminum wiring and metal plug is reduced, and contact resistance is increased. SOLUTION: By using a photomask, that makes a metal plug 7 project from the surface of an interlayer insulating film 4, and has a pattern formed in a shape for completely surrounding the metal plug 7 with a specific margin, the step of aluminum 8 and difference in the detection waveform of the grain of aluminum 8 are increased, and both waveforms can be identified clearly, thus improving the position accuracy in the aluminum wiring with respect to the metal plug 7. |
