DRYING METHOD AND DRYING PROCESSOR FOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a drying method reducing the amount of a gas, without reducing drying efficiency when drying a cleaned substrate. SOLUTION: In the drying method drying the substrate 4, cleaned by processing liquid by jetting the gas from an air knife 8 to the substrate while carrying it in a prescribed direction, the jetted amount of the gas from the air knife is controlled, corresponding to the relative position of the substrate and the air knife.