发明名称 PROCESSING APPARATUS AND METHOD
摘要 PROBLEM TO BE SOLVED: To quickly conduct laser annealing by effectively utilizing an output, without having to stop the operations of an excimer laser device. SOLUTION: A set of excimer laser device EL is shared by a pair of process chambers PC1, PC2 through the use of an optical path switch PS.
申请公布号 JP2002353159(A) 申请公布日期 2002.12.06
申请号 JP20010359105 申请日期 2001.11.26
申请人 SUMITOMO HEAVY IND LTD 发明人 HARADA MAKOTO
分类号 H01L21/20;H01L21/268;(IPC1-7):H01L21/268 主分类号 H01L21/20
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