| 摘要 |
PROBLEM TO BE SOLVED: To suppress drastic changes in the potential on a working object surface at opening and closing of a shutter plate. SOLUTION: When irradiating a substrate 38 with an ion beam IB from an ion source 10 and neutralizing the ion beam IB, by using neutralizing electrons e<-> generated by a microwave neutralizer 14, the substrate is shaded with the shutter plate 62 prior to and after milling the substrate 38, the voltage of a power source 34 is lowered at opening and closing of the shutter plate 62, the irradiated quantity of the ion beam IB is limited and the charge-up of the surface of the substrate 38 is suppressed.
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