METHOD FOR MENDING PATTERN ERROR OF SEMICONDUCTOR LAYER IN TFT LCD PANEL

摘要

PURPOSE: A method for mending a pattern error of a semiconductor layer in a TFT LCD panel is provided to remove a bad semiconductor layer without a damage of a base layer by using a plasma etch method instead of a laser etch method. CONSTITUTION: A metal is deposited on a glass substrate. A photoresist is applied on the metal of the glass substrate. A photoresist pattern is formed by exposing and developing the photoresist. A gate electrode(2) is formed by etching the exposed metal. A gate insulating layer and a semiconductor layer(4) are formed on a whole surface of the above structure. A photoresist is applied on the whole surface of the semiconductor layer(4). A photoresist pattern is formed by performing an exposure process and a developing process. An active region is formed by etching the semiconductor layer(4). A bad semiconductor layer pattern is removed by performing a plasma etch process. A metal is deposited thereon. A source(5) and a drain(6) are formed by patterning the metal. A data line(7) is formed by the metal patterning process. A passivation layer is deposited thereon. The drain(6) is exposed by forming a contact hole. An ITO layer is deposited thereon. A pixel electrode(9) is formed by performing a photo etch process.