WAFER EDGE EXPOSURE SYSTEM

摘要

PURPOSE: A wafer edge exposure system is provided to maximize the integrated amount of exposure in an exposure process by improving a structure of an exposure system. CONSTITUTION: A mask is formed with a glass plate. Only an aperture part of the glass mask is formed with a transparent portion in order to transmit the light. Chrome is coated on the remaining portion except for the aperture portion of the glass plate. An aperture is formed on a mask. The aperture has a contact portion of a concave curve. In the aperture having the contact portion of the concave curve, a phase(m) of a light source is contacted with two points of a boundary(s) between an exposure region of a wafer and an unexposed region of the wafer. Accordingly, a photoresist slope of an edge part of the wafer is improved in comparison with an existing mask.