发明名称 |
Method of manufacturing alignment mark |
摘要 |
A method for manufacturing a highly reliable alignment mark in which by-products do not form at an aligning mark position during patterning. In this method, an intermediate layer is disposed on an upper layer of a first wiring to protect the first wiring. Then, a filling material is coated thereon to fill in a through hole. Thereafter, a plug is formed by etch-backing, and a second wiring is formed.
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申请公布号 |
US2002178600(A1) |
申请公布日期 |
2002.12.05 |
申请号 |
US20020034108 |
申请日期 |
2002.01.03 |
申请人 |
MACHIDA SATOSHI;MINAMI AKIYUKI |
发明人 |
MACHIDA SATOSHI;MINAMI AKIYUKI |
分类号 |
G03F9/00;H01L21/027;H01L23/544;(IPC1-7):G01D21/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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