发明名称 Method and apparatus for developing photosensitive resin relief printing plate
摘要 A developing method for a photosensitive resin printing plate which can reduce the cost for treating waste liquid by using an aqueous developing liquid not containing surfactant and recycling and reusing the developing liquid. A photosensitive resin printing plate which is hardened in a prescribed pattern by exposure is developed by spraying an aqueous developing liquid comprising either water only or two phases of gas and liquid to a surface of printing plate under a high pressure (water pressure 1 to 30 MPa, gas pressure not lower than 0.1 MPa), a hygroscopic photosensitive resin mixed in a worn-out developing liquid is separated and removed by means of filter or the like, and filtrate is recycled and reused as a developing liquid.
申请公布号 US2002182543(A1) 申请公布日期 2002.12.05
申请号 US20020148989 申请日期 2002.06.06
申请人 FUJII HIROTATSU 发明人 FUJII HIROTATSU
分类号 G03F7/30;(IPC1-7):G03F7/30 主分类号 G03F7/30
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