发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A lithographic projection apparatus comprising a first radiation system for providing a first projection beam of radiation; a second radiation system for providing a second projection beam of radiation; a support structure for supporting a first patterning structure and a second patterning structure, the first patterning structure serving to pattern the first projection beam according to a second pattern and the second patterning structure serving to pattern the second projection beam according to a second pattern; a substrate table for holding a substrate; a projection system for combining the first and second patterned beams and projecting the combined beam onto a target portion of the substrate.
|
申请公布号 |
US2002180943(A1) |
申请公布日期 |
2002.12.05 |
申请号 |
US20020136620 |
申请日期 |
2002.05.03 |
申请人 |
MULKENS JOHANNES CATHARINUS HUBERTUS;MOERS MARCO HUGO PETRUS |
发明人 |
MULKENS JOHANNES CATHARINUS HUBERTUS;MOERS MARCO HUGO PETRUS |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03B27/74 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|