发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM RESIST AND PHOTOSENSITIVE COVER RAY FILM USING THE SAME
摘要 <p>A photosensitive resin composition comprising a soluble polyimide, a compound having a carbon-carbon double bond and a photoreaction initiator and/or photosensitizer as main components; a photosensitive dry film resist using the composition; and a photosensitive dry film resist exhibiting excellent flame retardance. The resin composition affords a photosensitive dry film resist and a photosensitive cover ray film which exhibits good workability, can be developed with an alkaline solution, and satisfy the flame retardancy standard UL94V-0. Further, the film can be directly laminated without the use of an adhesive and is excellent in heat resistance, and thus can be suitably used as a photosensitive cover ray film for a printed board for use in electronic materials, a suspension for a hard disk, and the head portion of a hard disk in a personal computer.</p>
申请公布号 WO2002097532(P1) 申请公布日期 2002.12.05
申请号 JP2002005249 申请日期 2002.05.29
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