METHOD FOR FABRICATING IMAGE SENSING DEVICE COMBINED WITH WAVEGUIDE TYPE ANTENNA

摘要

PURPOSE: A method for fabricating an image sensing device combined with a waveguide type antenna is provided to combine a cylindrical antenna with a sensing element by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A metal layer(110) is formed on a surface of a semiconductor substrate(100) in order to form a seed layer on the surface of the semiconductor substrate(100). A photoresist layer(120) of predetermined thickness is applied on an upper face of the metal layer(110). The thickness of photoresist layer(120) is about 100 to 200 micro meter. A patterning process is performed using an exposure mask. A photoresist layer pattern is formed by removing partially the photoresist layer(120) from the metal layer(110). A circular pillar of a waveguide type antenna is formed by removing the photoresist layer pattern. A conductive layer(140) is deposited on a whole surface of the above structure by using an electroless plating method. The remaining photoresist pattern is removed. A structure of a waveguide is fabricated by separating the metal layer(110) from the above structure.