发明名称 MIM capacitor and manufacturing method therefor
摘要 A downsized, high-capacity MIM capacitor provided on a compound semiconductor includes a lower electrode comprising a plurality of metal layers including a top metal layer, an upper electrode, and a dielectric layer positioned between the lower electrode and the upper electrode. The entire surface of the top metal layer is oxidized to form an insulating metal oxide layer.
申请公布号 US2002179952(A1) 申请公布日期 2002.12.05
申请号 US20010989962 申请日期 2001.11.21
申请人 MURATA MANUFACTURING CO., LTD 发明人 NAKATA HIDEFUMI
分类号 H01G4/08;H01G4/33;H01L21/02;H01L21/314;H01L21/316;H01L21/822;H01L21/8242;H01L23/522;H01L27/04;(IPC1-7):H01L27/108 主分类号 H01G4/08
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