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发明名称
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要
<p>펀치스루 내성을 높인다. 카운터 도핑층(5)에 대향하는 게이트 전극(7)이, 반도체 기판(100) 주면에 형성된 홈(50)에 매설되고, 홈(50)의 양측에 소스·드레인층(12)이 형성되어 있다. 이에 따라, 카운터 도핑층(5)보다도 소스·드레인층(12)이 얕게 형성되어 있다.</p>
申请公布号
KR100363353(B1)
申请公布日期
2002.12.05
申请号
KR20010006973
申请日期
2001.02.13
申请人
发明人
分类号
H01L21/28;H01L21/336;H01L29/417;H01L29/78
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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