| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for producing a photomask blank capable of producing a photomask having high accuracy of position, to provide such a photomask blank and to provide a method for producing such a photomask having high accuracy of position. SOLUTION: In the method for producing a photomask blank, an electrically conductive light shielding film is formed on the surface of one side of a glass substrate through a step for forming a light shielding material into a film while fixing the material on one side of the glass substrate by first substrate support parts and a step for forming a light shielding material into a film while fixing the material on the one side by second substrate support parts which do not overlap the first substrate support parts. In the method for producing a photomask, a photosensitive resin is disposed on the resulting photomask blank comprising the glass substrate and the electrically conductive light shielding film formed on the whole surface of one side of the substrate and exposure with an electron beam exposure system, development and etching are carried out.</p> |
