| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaporation source which can heat a vaporizing material only during forming a thin film, and start evaporation in a short time, and to provide a method and an apparatus for forming a thin film, having high stability and productivity. SOLUTION: The evaporation source comprised of a material vessel for accommodating an vaporizing material and a heating mechanism for heating the vaporizing material in the material vessel, is characterized by including a radiation heater for heating the vaporizing material, which is arranged above the material vessel, irradiates the surface of the vaporizing material in the vessel, and directly heats the material with the radiant heat of the radiation heater. The face of the radiation heater is preferably made from a ceramic- based material. The evaporation source is characterized in that either of the radiation heater for heating the vaporizing material or the material vessel has a transferring mechanism for approaching or separating each other, which makes the radiation heater approach to the material vessel during formation of the thin film, and separates them after the formation.
|
