| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, in which the diffusion distance of an acid generated by a photo acid generating agent in a photosensitive resin layer is controlled. SOLUTION: When the photosensitive resin layer formed from the photosensitive resin composition containing the photo acid generating agent and a cross- linking agent is exposed and baked with exposure at 120 deg.C for time T, the relation between the time T and the diffusion distance (γ) of the acid generated by the photo acid generating agent in the photosensitive resin layer satisfies formulas, (1) and (2). Formula (1) 15 s<=T<=30 s Formula (2) 1 μm<=γ<=2 μm. |
