ETHER MONOMER WITH POLYCYCLIC STRUCTURE, PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFYING TYPE RESIST COMPOSITION OBTAINED THEREFROM

摘要

PROBLEM TO BE SOLVED: To provide a monomer with a polycyclic structure that has an alkenyl ether as a basic structure, a photosensitive polymer as a polymer product therefrom, and a resist composition comprising the polymer. SOLUTION: This photosensitive polymer has a monomer unit having a structure represented by the following formula (wherein R4 and R5 are each hydrogen atom or a methyl group; and R6 and R7 are each independently a hydrogen atom, a hydroxyl group, or a 1-20C hydrocarbon group that may comprise an oxygen atom and/or a halogen atom).