发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition having excellent workability, profitability and storage stability and used as a material for a planographic printing plate for scanning exposure, which is suitable for a Computer To Plate(CTP) system, or for a planographic printing original plate having high sensitivity to oscillation wave length of an inexpensive short wave semiconductor laser and to provide the planographic printing original plate having a photosensitive layer formed from the photosensitive composition using a novel photopolymerization initiation system having high sensitivity to a wave length widely ranging from 350 nm to 450 nm. SOLUTION: The photosensitive composition contains (1) a sensitizing dyestuff having a specific structure, (2) a titanocene compound and (3) a compound which is held in a state where at least one of the physical property and the chemical property is changed with reaction with at least one of a radical and an acid.
申请公布号 JP2002351071(A) 申请公布日期 2002.12.04
申请号 JP20010159059 申请日期 2001.05.28
申请人 FUJI PHOTO FILM CO LTD 发明人 SHIBUYA AKINORI;KUNIDA KAZUTO
分类号 G03F7/031;C08F2/50;G03F7/00;G03F7/027;G03F7/029 主分类号 G03F7/031
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