发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a polishing device manufacturable with high polishing efficiency and inexpensively without requiring labor. SOLUTION: In this polishing device having a polishing means 6 which performs a work for a surface 8 of a material 9 to be worked by being attachably/detachably and loosely fixed to a polishing shoe 1, is movable via movement of the polishing shoe 1 by an actuator 2 of a piezoelectric element, for instance, and is movable in at least a horizontal direction by being extended parallel to the surface 8, the polishing shoe 1 is made to generate vertical direction movement V applied in a direction orthogonally crossing the surface 8, the vertical direction movement V is fluctuated by almost a sine wave shape or almost a pulse shape as a function of time, and is fluctuated in waveform by a frequency f of 1 Hz to 500 Hz and an amplitude A of 10μm to 500μm, in particular. An electronic control unit 16 performs a control so that a side in contact with the surface 8 of the polishing shoe 1 may be applied by the whole of the side surface or in dotted states, based on an input signal from a sensor 17.
申请公布号 JP2002346905(A) 申请公布日期 2002.12.04
申请号 JP20020150860 申请日期 2002.05.24
申请人 HILTI AG 发明人 EBERHARD LANG;SCHADOFFSKY OLAF
分类号 B24B1/04;B24B23/06;(IPC1-7):B24B23/06 主分类号 B24B1/04
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