| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion injector that makes it possible to inject uniform ions into substrates and can generate a treatment layer of high quality whose thickness is uniform and which is stable in the substrates. SOLUTION: The ion injector has a vacuum container 1 with a vacuum exhaust hole 6 and an introduction hole 5 for a plasma material, a substrate holding jig 21 that holds the substrates 10 inside the vacuum container 1, a bushing 12 that provides insulation between the substrate holding jig 21 and the vacuum container 1, a pulse high-voltage power source 15 that applies a positive or negative voltage to the substrates 10, a high-frequency induction coil 25 that generates discharge plasma in the vacuum container 1 to inject ions into the substrates 10 and a high-frequency oscillator that supplies a high- frequency current to the high-frequency induction coil 25. A hollow cylindrical tube 20 made of an insulation material that transmits an electromagnetic wave is placed in the vacuum container 1 to encase the substrate holding jig 21 in the hollow cylindrical tube 20. The high-frequency induction coil 25 is wrapped around the outer circumference of the hollow cylindrical tube 20 at prescribed intervals. |
