发明名称 OBSERVATION APPARATUS USING LIGHT AND X-RAY, EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an observation apparatus which enables observing both images formed by radiating light and images formed by radiating X-rays by one imaging element and eliminates an imaging function for X-rays from the imaging element. SOLUTION: When the X-ray 5a is radiated to a substrate 15 which becomes a circuit board, a fluorescent image of a registration mark of the substrate 15 is formed on a scintillator film 19. When a visible beam of light 21a is radiated to a mask substrate 17, a projection image of a registration mark of the mask substrate 17 is formed on the scintillator film 19. These images are imaged by a CCD camera 6.
申请公布号 JP2002350111(A) 申请公布日期 2002.12.04
申请号 JP20010157436 申请日期 2001.05.25
申请人 HAMAMATSU PHOTONICS KK 发明人 NAGAI TSUTOMU
分类号 G01B11/00;G01B15/00;G01T1/00;G01T1/20;G03F9/00;G21K5/00;G21K5/02;H01L21/027;H05K1/02;H05K3/00;(IPC1-7):G01B11/00 主分类号 G01B11/00
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