发明名称 OPTICAL MULTI-LAYER STRUCTURE AND ITS MANUFACTURING METHOD, OPTICAL SWITCHING ELEMENT, AND IMAGE DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an optical multi-layer structure which can be manufactured on an arbitrary substrate without taking the material of the substrate into consideration and favorably used for an image display device. SOLUTION: The substrate 10 is made, for example, of silicon(Si) and has a meshed, planar shape consisting of openings 10A and a frame part 10F surrounding it. The optical multi-layer structure 1 has a 1st layer 11, a gap part 12 which has a dimension to cause an interference phenomenon of light and is variable in size, and a 2nd layer 13 arranged in this order on the openings 10A of the substrate 10. The film thicknesses of the 1st layer 11 and 2nd layer 13 and the size of the gap part 12 can be designed without taking the optical characteristics of the substrate 10 into consideration. The substrate 10 is made of silicon, and hence the substrate is not affected by a high-temperature process and has a greater degree of freedom. The optical multi-layered structure 1, a driving circuit, etc., can be manufactured on the same substrate 10.
申请公布号 JP2002350751(A) 申请公布日期 2002.12.04
申请号 JP20010161840 申请日期 2001.05.30
申请人 SONY CORP 发明人 ISHIKAWA HIROKAZU
分类号 G02B26/08;B81B3/00;B81C1/00;(IPC1-7):G02B26/08 主分类号 G02B26/08
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