发明名称 SCANNING PROBE MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a scanning probe microscope most suitable for measuring a pit of a stamper in a semiconductor pattern or an optical disk, etc., namely, a scanning probe microscopy with higher repetition accuracy free from any nonlinear operation, drift, or interference behavior of XYZ-axis. SOLUTION: The scanning probe microscope is characterized by that it comprises a stereoscopic structure 103 provided on a free end of a cylindrical piezoelectric element, operating together with the free end, a fixed structure 104, placed and fixed near around the stereoscopic structure 103 at regular clearances so as not to come in contact with the stereoscopic structure 103, providing a reference standard position, a clearance measuring means 105 measuring multidirectional clearances between the stereoscopic structure 103 and the fixed structure 104 as needed, an information storage means 113 storing the information on clearance variation, and a computer 114 reproducing the surface shape of a sample by using the information on clearance variation.
申请公布号 JP2002350319(A) 申请公布日期 2002.12.04
申请号 JP20010196608 申请日期 2001.06.28
申请人 SEIKO INSTRUMENTS INC 发明人 HONMA KATSUNORI;EGAWA AKIRA;MIYATANI TATSUYA
分类号 G01B21/30;G01Q10/04;G01Q30/06;G01Q60/24;(IPC1-7):G01N13/10 主分类号 G01B21/30
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