POSITIVE TYPE PHOTOSENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type photosensitive composition having high sensitivity, wide defocus latitude when zone illumination is used and hardly generating side lobe when a pattern is formed by using a half-tone phase shift mask. SOLUTION: The positive photosensitive composition contains (A) a specific acid generating agent generating an acid by the irradiation with active ray or radiation and (B) a resin having a single cyclic or polycyclic aliycyclic hydrocarbon structure, decomposed by the action of the acid and having solubility increased in an alkali developer.