| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for stripping a resist, which is capable of removing resist residue generated in the formation of wiring and excellently preventing the corrosion of a metallic wiring material in the manufacturing process of an electronic circuit for a semiconductor or a liquid crystal or the like. SOLUTION: The composition for stripping the resist contains at least one kind of a compound selected from a group expressed by formula (1). (In the formula (1), each of R1 -R4 is the same or different and represents hydrogen atom, a lower alkyl group, hydroxide group, carboxylic group, hydroxyalkyl group, alkoxy group, halogen atom or amino group. |
