| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum film-forming apparatus which does not reduce film-forming accuracy caused by distortion generated in a vacuum chamber, without making a structure of the vacuum chamber complicated and upsized. SOLUTION: The vacuum film-forming apparatus 30 comprises a vacuum chamber 1 of which the internal space is made to be vacuum atmosphere, a substrate rotating unit 2 for supporting a substrate 10, and a monitoring-light receiving part 11 and a light projecting part 12 for detecting film thickness formed on the substrate 10. The monitoring-light receiving part 11 and the monitoring-light projecting part 12 are fixed to standstill structures 18 and 17 on the outside of the vacuum chamber 1. The substrate-rotating unit 2 is fixed to both of the standstill structure 18 on the outside of the vacuum chamber 1, and the vacuum chamber 1 through a buffering means 21.
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