发明名称 METHOD FOR FABRICATING PHOSPHOR FOR FIELD EMISSION DISPLAY
摘要 PURPOSE: A method for fabricating a phosphor for field emission display is provided to prevent a damage of the phosphor due to the scanned electrons by using Yttrium silicate oxide phosphor. CONSTITUTION: An initial reactant is mixed by (1-x)Y2O3+SiO2+xCeCl3 where a value of x is 0<x<0.1. The mixed reactant is put into a reaction vessel. A firing process for the mixed reactant is performed the temperature of 1300°C or less during 10 hours. A reductive process is performed during a predetermined time by using a reductive gas. Yttrium silicate is formed by performing the reductive process. The reaction vessel is formed with an aluminous melting pot. The reduction process is performed by using one of the mixed gas (100-y)% CO2+y%CO and the mixed gas of (100-x)%N2+x%H2 where the value of x is more than 5.
申请公布号 KR100365129(B1) 申请公布日期 2002.12.04
申请号 KR19970071089 申请日期 1997.12.19
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 BYUN, JAE DONG;CHO, GYEONG IK;SEO, GYEONG SU
分类号 H01J1/30;H01J1/63;(IPC1-7):H01J17/49 主分类号 H01J1/30
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